Please use this identifier to cite or link to this item: https://repository.ukwk.ac.id/handle/123456789/103
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dc.contributor.authorE. E, Yunanta-
dc.contributor.authorT, Aizawa-
dc.contributor.authorN. T, Redationo-
dc.date.accessioned2018-10-24T05:24:58Z-
dc.date.available2018-10-24T05:24:58Z-
dc.date.issued2012-03-
dc.identifier.urihttp://repository.ukwk.ac.id/handle/123456789/103-
dc.description.abstractDiamond-like carbon (DLC) coating has been widely used as an efficient and reliable protective coating. To recycle the mold-die substrates, the used DLC coating must be perfectly removed before re-coating without damage to substrates and residuals. The RF-DC high dense plasma etching or ashing process is utilized to describe the plasma-etching behavior by using the spectroscopic analysis. First, RF- and DC-voltages together with pressure are varied in this oxygen plasma etching to search for an optimum condition; DC-bias is -450 V, RF voltage is 250 V and oxygen gas pressure 40 Pa. Oxygen plasma spectrum is analyzed to define the pure oxygen plasma. It is composed of oxygen atoms, activated oxygen atoms, and molecules. In-situ plasma monitoring is also used to measure CO peak in the range 200-300 nm. Detection of CO peak proves that carbon in DLC coating is reacted with oxygen flux; i.e. C (in DLC) + O  CO. Variation of CO peaks correspond to etching behavior.-
dc.language.isoen_USen_US
dc.publisherSouth East Asian Technical University Consortium (SEATUC)en_US
dc.titlePlasma Diagnosis In Etching and Ashing of Diamond Carbon Coatingen_US
dc.typeArticleen_US
Appears in Collections:International Proceeding

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