Please use this identifier to cite or link to this item: https://repository.ukwk.ac.id/handle/123456789/103
Title: Plasma Diagnosis In Etching and Ashing of Diamond Carbon Coating
Authors: E. E, Yunanta
T, Aizawa
N. T, Redationo
Issue Date: Mar-2012
Publisher: South East Asian Technical University Consortium (SEATUC)
Abstract: Diamond-like carbon (DLC) coating has been widely used as an efficient and reliable protective coating. To recycle the mold-die substrates, the used DLC coating must be perfectly removed before re-coating without damage to substrates and residuals. The RF-DC high dense plasma etching or ashing process is utilized to describe the plasma-etching behavior by using the spectroscopic analysis. First, RF- and DC-voltages together with pressure are varied in this oxygen plasma etching to search for an optimum condition; DC-bias is -450 V, RF voltage is 250 V and oxygen gas pressure 40 Pa. Oxygen plasma spectrum is analyzed to define the pure oxygen plasma. It is composed of oxygen atoms, activated oxygen atoms, and molecules. In-situ plasma monitoring is also used to measure CO peak in the range 200-300 nm. Detection of CO peak proves that carbon in DLC coating is reacted with oxygen flux; i.e. C (in DLC) + O  CO. Variation of CO peaks correspond to etching behavior.
URI: http://repository.ukwk.ac.id/handle/123456789/103
Appears in Collections:International Proceeding

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